公开(公告)号：WO2019048293A1

公开(公告)日：2019-03-14

申请号：PCT/EP2018/073161

申请日：2018-08-28

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： TSENG, Kuo-Feng ,  DONG, Zhonghua ,  WANG, Yixiang ,  CHEN, Zhongwei

IPC: H01J37/28

Abstract: Disclosed herein is an apparatus comprising: a source configured to emit charged particles, an optical system and a stage; wherein the stage is configured to support a sample thereon and configured to move the sample by a first distance in a first direction; wherein the optical system is configured to form probe spots on the sample with the charged particles; wherein the optical system is configured to move the probe spots by the first distance in the first direction and by a second distance in a second direction, simultaneously, while the stage moves the sample by the first distance in the first direction; wherein the optical system is configured to move the probe spots by the first distance less a width of one of the probe spots in an opposite direction of the first direction, after the stage moves the sample by the first distance in the first direction.

公开(公告)号：WO2019025188A1

公开(公告)日：2019-02-07

申请号：PCT/EP2018/069524

申请日：2018-07-18

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： ZHANG, Frank, Nan ,  CHEN, Zhongwei ,  WANG, Yixiang ,  SHEN, Ying, Crystal

IPC: H01J37/26 ,  H01J37/28

Abstract: Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.

公开(公告)号：WO2018197169A1

公开(公告)日：2018-11-01

申请号：PCT/EP2018/058631

申请日：2018-04-04

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： HU, Xuerang ,  REN, Weiming ,  LIU, Xuedong ,  CHEN, Zhongwei

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/12

Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer; a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the electrically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.

公开(公告)号：WO2018145983A1

公开(公告)日：2018-08-16

申请号：PCT/EP2018/052480

申请日：2018-02-01

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： WANG, Yongxin ,  REN, Weiming ,  DONG, Zhonghua ,  CHEN, Zhongwei

IPC: H01J37/244 ,  H01J37/28

Abstract: Systems and methods are provided for charged particle detection. The detection system comprises a signal processing circuit (502) configured to generate a set of intensity gradients based on electron intensity data received from a plurality of electron sensing elements (244). The detection system further comprises a beam spot processing module (506) configured to determine, based on the set of intensity gradients, at least one boundary of a beam spot; and determine, based on the at least one boundary, that a first set of electron sensing elements of the plurality of electron sensing elements is within the beam spot. The beam spot processing module can further be configured to determine an intensity value of the beam spot based on the electron intensity data received from the first set of electron sensing elements and also generate an image of a wafer based on the intensity value.