Abstract:
본 발명은 이상 유동 발생 노즐이 구비된 태양광 발전설비의 효율향상설비에 관한 것으로, 더욱 상세하게는 좌우 회전 각도의 조절이 용이하며, 분사 효율을 높여 태양광 발전설비의 효율 향상에 기여할 수 있도록 한 이상 유동 발생 노즐이 구비된 태양광 발전설비의 효율향상설비에 관한 것으로, 본 발명에 따른 태양광 발전설비의 효율향상설비는 비교적 간단한 구조의 이상 유동 발생 노즐을 사용함으로써 조립, 체결 및 설치의 편의성을 향상시키고, 이상 유동 발생 노즐의 좌우 회전 각도의 조절이 용이하여 분사효율이 향상된 태양광 발전설비의 효율향상설비에 관한 것이다.
Abstract:
A liquid treatment apparatus (10) for processing a liquid includes an inlet nozzle (12) having an orifice (16) for directing a flow of liquid through the orifice (16) to define a fluid jet, and a concial diffuser (18) including a tip (20), a base portion (22), and a curved surface (26) therebetween. The conical diffuser (18) is generally aligned with the orifice (1 6) such that the fluid jet impacts upon the tip (20) of the conical diffuser (18). Moreover, the curvature of the curved surface (26) is selected to maintain a substantially constant Froude number of the liquid along the conical diffuser (18).
Abstract:
A device and associated method for the dispensation of mists for therapeutic use, comprising: a dispensing member (2) for dispensing an air flow (3) within which micronized particles of a liquid or solid therapeutic substance are dispersed; a chamber (11) having at least one inlet (12) for said air flow (3) generated by the dispensing member (2) and at least one outlet (13) for said air flow (3) present inside the chamber (11) itself; and a communication conduit (10) interposed between said dispensing member (2) and said chamber (11) in order to introduce the air flow (3) into the chamber (11) itself; said chamber (11) being switchable between an operative condition of maximum volume in which it internally defines a space (20) for containing at least one user, and a non-operative condition of minimum volume suitable for transport and/or storage.
Abstract:
The invention relates to removal from the working area of a dust and gas mixture produced by action of a processing tool on the material being processed. The present dust and gas valve is intended to be mounted in an apparatus for processing materials. The dust and gas valve comprises a casing adapted to accommodate a processing tool and to be connected to a system for aspirating the produced dust and gas mixture, and means for directing the dust and gas mixture into the casing. According to the invention said means comprises: a unit for directional supply of compressed air to the working area, and a dust and gas mixture flow guiding element having a lower surface disposed around the working area and streamlined for the dust and gas mixture flow.
Abstract:
A vehicle wash component (10) for a vehicle wash system, including a frame portion (22, 24) and an air delivery portion (52) disposed on the frame portion (22, 24). The air delivery portion (52) is configured to emit high velocity air onto a vehicle exterior. A fluid delivery portion (54, 56) is disposed on the frame portion (22, 24). The fluid delivery portion (54, 56) is configured to emit high pressure fluid onto the vehicle exterior. The fluid delivery portion (54, 56) is disposed rearward from the air delivery portion (52) with respect to a direction of travel of a vehicle. The air delivery portion (52) and the fluid delivery portion (54, 56) are configured to emit the high velocity air and the high pressure fluid onto the vehicle exterior simultaneously.
Abstract:
A device is disclosed for dispensing injecting fluids. The device comprises an inlet arranged to accept a higher viscosity fluid and a further inlet arranged to accept a lower viscosity fluid. A flow arranging part arranges the liquids from the inlets into a core-annular configuration which the higher viscosity fluid is surrounded by lower viscosity fluid. This flow is then passed out through an outlet.
Abstract:
The invention relates to a method or a system for coating substrates with at least one coating material which comprises an organic component, wherein the coating material is applied by means of atomization and spray-painting on the substrate. The invention is characterized in that the coating material is atomized by means of water vapor. The invention also relates to a system for coating substrates, wherein at least one nozzle arrangement (1) is provided in order to atomize and spray the coating material onto a substrate, and at least one first supply device (8) which is used to prepare and supply the coating material to the nozzle arrangement (1), in addition to at least one second supply device (9) which is used to prepare and supply the steam as auxiliary gas to the nozzle arrangement (1).
Abstract:
The method for coating a substrate (12) with a relatively thin, uniform film of a fluid (20) with a minimum of waste. A volume of fluid is produced and the size and velocity of the volume of fluid are selected such that the volumes of the fluid break upon impact (24) with the substrate without splashing or rippling. The apparatus and method are ideal for coating semiconductor wafers with a photoresist solution. The kenetic energy of the volume of fluid is adjusted to overcome the free energy associated with the surface tension on impact. The collision of the fluid thus results in a uniform, thin coating of photoresist or other coating solution which may then be further processed by conventional techniques.
Abstract:
The invention is directed to a method and apparatus for coating substrates by a liquid spray so as to avoid entrapment of gaseous bubbles, particularly air bubbles, in the coating and desirably to thereby obtain bubble-free coatings. More particularly, the invention involves spray applying the coating to a substrate in an atmosphere consisting of gases having appreciable solubility in the applied coating, such as carbon dioxide, such that gas bubbles that may become entrapped in the coating are removed after application by the gases dissolving into the coating and diffusing to the surface.