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公开(公告)号：WO2010151466A2
公开(公告)日：2010-12-29
申请号：PCT/US2010/038790
申请日：2010-06-16
申请人： MKS INSTRUMENTS, INC. , NAGARKATTI, Siddharth , TIAN, Feng , LAM, David , RASHID, Abdul , BENZERROUK, Souheil , BYSTRYAK, Ilya , MENZER, David , SCHUSS, Jack, J. , AMBROSINA, Jesse, E.
发明人： NAGARKATTI, Siddharth , TIAN, Feng , LAM, David , RASHID, Abdul , BENZERROUK, Souheil , BYSTRYAK, Ilya , MENZER, David , SCHUSS, Jack, J. , AMBROSINA, Jesse, E.
IPC分类号： H02J17/00
CPC分类号： H03K5/01 , H03F3/189 , H03F3/217 , H03F2200/105 , H03F2200/375 , H03F2200/387 , H03G3/3047
摘要： A method for controlling pulsed power that includes measuring a first pulse of power from a power amplifier to obtain data. The method also includes generating a first signal to adjust a second pulse of delivered power, the first signal correlated to the data to minimize a power difference between a power set point and a substantially stable portion of the second pulse. The method also includes generating a second signal to adjust the second pulse of delivered power, the second signal correlated to the data to minimize an amplitude difference between a peak of the second pulse and the substantially stable portion of the second pulse.
摘要翻译： 一种用于控制脉冲功率的方法，包括从功率放大器测量第一功率脉冲以获得数据。 该方法还包括产生第一信号以调整输出功率的第二脉冲，第一信号与数据相关，以最小化功率设定点与第二脉冲的基本稳定部分之间的功率差。 该方法还包括产生第二信号以调整传递功率的第二脉冲，第二信号与数据相关，以最小化第二脉冲的峰值与第二脉冲的基本上稳定的部分之间的幅度差异。
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2.发明申请
公开(公告)号：WO2012018367A3
公开(公告)日：2012-03-29
申请号：PCT/US2011001176
申请日：2011-06-30
申请人： LAM RES CORP , SHAJII ALI , GOTTSCHO RICHARD , BENZERROUK SOUHEIL , COWE ANDREW , NAGARKATTI SIDDHARTH P , ENTLEY WILLIAM R
发明人： SHAJII ALI , GOTTSCHO RICHARD , BENZERROUK SOUHEIL , COWE ANDREW , NAGARKATTI SIDDHARTH P , ENTLEY WILLIAM R
IPC分类号： H05B31/26
CPC分类号： H05H1/46 , H01J37/321 , H01J37/3211 , H01J37/32357 , H01J37/32422 , H01J37/3244 , H01J37/32449 , H01J37/3266 , H01J37/32669 , H01J37/32816 , H01J2237/334 , H05H2001/4652 , H05H2001/4682
摘要： A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described.
摘要翻译： 等离子体源包括环等离子体室，围绕环等离子体室的外部的初级绕组和多个铁氧体，其中环等离子体室穿过每个铁氧体。 还描述了用于产生等离子体的系统和方法。
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3.发明申请INFRARED DEFECT DETECTION SYSTEM AND METHOD FOR THE EVALUATION OF POWDERMETALLIC COMPACTS 审中-公开红外缺陷检测系统和方法用于评估血压综合征
公开(公告)号：WO2007147158A3
公开(公告)日：2008-04-24
申请号：PCT/US2007071451
申请日：2007-06-18
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/30164
摘要： A pulsed thermography defect detection apparatus including active and passive infrared (IR) thermography for non-destructive testing (NDT) of powdermetallic (P/M) components for on-line and off-line inspection.
摘要翻译： 一种脉冲热成像缺陷检测装置，包括用于在线和离线检查的粉末金属（P / M）部件的无损检测（NDT）的主动和被动红外（IR）热成像。
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公开(公告)号：WO2010151466A3
公开(公告)日：2011-11-17
申请号：PCT/US2010038790
申请日：2010-06-16
申请人： MKS INSTR INC , NAGARKATTI SIDDHARTH , TIAN FENG , LAM DAVID , RASHID ABDUL , BENZERROUK SOUHEIL , BYSTRYAK ILYA , MENZER DAVID , SCHUSS JACK J , AMBROSINA JESSE E
发明人： NAGARKATTI SIDDHARTH , TIAN FENG , LAM DAVID , RASHID ABDUL , BENZERROUK SOUHEIL , BYSTRYAK ILYA , MENZER DAVID , SCHUSS JACK J , AMBROSINA JESSE E
IPC分类号： H02J17/00
CPC分类号： H03K5/01 , H03F3/189 , H03F3/217 , H03F2200/105 , H03F2200/375 , H03F2200/387 , H03G3/3047
摘要： A method for controlling pulsed power that includes measuring a first pulse of power from a power amplifier to obtain data. The method also includes generating a first signal to adjust a second pulse of delivered power, the first signal correlated to the data to minimize a power difference between a power set point and a substantially stable portion of the second pulse. The method also includes generating a second signal to adjust the second pulse of delivered power, the second signal correlated to the data to minimize an amplitude difference between a peak of the second pulse and the substantially stable portion of the second pulse.
摘要翻译： 一种用于控制脉冲功率的方法，包括从功率放大器测量第一功率脉冲以获得数据。 该方法还包括产生第一信号以调整输出功率的第二脉冲，第一信号与数据相关，以最小化功率设定点与第二脉冲的基本稳定部分之间的功率差。 该方法还包括产生第二信号以调整传递功率的第二脉冲，第二信号与数据相关，以最小化第二脉冲的峰值与第二脉冲的基本上稳定的部分之间的幅度差异。
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5.发明申请METHOD AND APPARATUS OF PROVIDING POWER TO IGNITE AND SUSTAIN A PLASMA IN A REACTIVE GAS GENERATOR 审中-公开向IGNITE提供电力的方法和装置，并在可靠的气体发生器中保持等离子体
公开(公告)号：WO2010098779A1
公开(公告)日：2010-09-02
申请号：PCT/US2009/040358
申请日：2009-04-13
申请人： MKS INSTRUMENTS, INC. , BENZERROUK, Souheil , NAGARKATTI, Siddharth, P. , COWE, Andrew , SHAJII, Ali , AMBROSINA, Jesse, E. , TRAN, Ken , CHEN, Xing
发明人： BENZERROUK, Souheil , NAGARKATTI, Siddharth, P. , COWE, Andrew , SHAJII, Ali , AMBROSINA, Jesse, E. , TRAN, Ken , CHEN, Xing
IPC分类号： H01J37/32
CPC分类号： H01J37/32009 , H01J37/321
摘要： Described are methods and apparatuses, including computer program products, for igniting and/or sustaining a plasma in a reactive gas generator. Power is provided from an ignition power supply to a plasma ignition circuit. A pre-ignition signal of the plasma ignition circuit is measured. The power provided to the plasma ignition circuit is adjusted based on the measured pre-ignition signal and an adjustable pre-ignition control signal. The adjustable pre-ignition control signal is adjusted after a period of time has elapsed.
摘要翻译： 描述了用于在反应性气体发生器中点燃和/或维持等离子体的方法和装置，包括计算机程序产品。 从点火电源向等离子体点火电路供电。 测量等离子体点火电路的预点火信号。 基于所测量的预先点火信号和可调节的预点火控制信号来调节提供给等离子体点火电路的功率。 经过一段时间后，调节可调节点火控制信号。
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6.发明申请DISTRIBUTED, NON-CONCENTRIC MULTI-ZONE PLASMA SOURCE SYSTEMS, METHODS AND APPARATUS 审中-公开分布式，非浓度多区域等离子体源系统，方法和装置
公开(公告)号：WO2013074824A1
公开(公告)日：2013-05-23
申请号：PCT/US2012/065333
申请日：2012-11-15
申请人： LAM RESEARCH CORPORATION , SHAJII, Ali , GOTTSCHO, Richard , BENZERROUK, Souheil , COWE, Andrew , NAGARKATTI, Siddharth, P. , ENTLEY, William, R.
发明人： SHAJII, Ali , GOTTSCHO, Richard , BENZERROUK, Souheil , COWE, Andrew , NAGARKATTI, Siddharth, P. , ENTLEY, William, R.
IPC分类号： H05H1/00
CPC分类号： H05H1/46 , H01J37/32082 , H01J37/321 , H01J37/32422 , H01J37/32449 , H01J37/3266 , H01J37/32669 , H01J37/32816 , H01J2237/334 , H05H1/50 , H05H2001/4682
摘要： The present invention fills these needs by providing a distributed multi-zone plasma source. It should be appreciated that the present invention can be implemented in numerous ways, including as a process, an apparatus, a system, computer readable media, or a device. Several inventive embodiments of the present invention are described below. One embodiment provides a processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. Multiple plasma chamber outlets can couple a plasma chamber of each one of the plasma sources to the process chamber.
摘要翻译： 本发明通过提供分布式多区域等离子体源来满足这些需求。 应当理解，本发明可以以多种方式实现，包括作为过程，装置，系统，计算机可读介质或设备。 下面描述本发明的几个发明实施例。 一个实施例提供在处理室顶部中包括多个等离子体源的处理室。 每个等离子体源是包括初级绕组和多个铁氧体的环形等离子体源。 多个等离子体室出口可以将每个等离子体源的等离子体室耦合到处理室。
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公开(公告)号：WO2012078253A1
公开(公告)日：2012-06-14
申请号：PCT/US2011/057814
申请日：2011-10-26
IPC分类号： H01J37/32
CPC分类号： H01J37/32935 , H01J37/321 , H01J37/32174
摘要： Methods, systems, and computer program products are described for measuring and controlling parameters of a plasma generator. A current in a primary winding of a transformer or inductive element that generates a plasma is measured. A voltage across a secondary winding of the transformer or inductive element is measured. Based on the current of the primary winding and the voltage across the secondary winding, a parameter of the plasma is determined. The parameter includes a resistance value associated with the plasma, a power value associated with the plasma, or both.
摘要翻译： 描述了用于测量和控制等离子体发生器参数的方法，系统和计算机程序产品。 测量产生等离子体的变压器或电感元件的初级绕组中的电流。 测量变压器或电感元件的次级绕组两端的电压。 基于初级绕组的电流和次级绕组两端的电压，确定等离子体的参数。 该参数包括与等离子体相关联的电阻值，与等离子体相关联的功率值或两者。
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8.发明申请INFRARED DEFECT DETECTION SYSTEM AND METHOD FOR THE EVALUATION OF POWDERMETALLIC COMPACTS 审中-公开红外缺陷检测系统和方法用于评估血压综合征
公开(公告)号：WO2007147158A2
公开(公告)日：2007-12-21
申请号：PCT/US2007/071451
申请日：2007-06-18
IPC分类号： G06T7/40
CPC分类号： G06T7/0004 , G06T2207/30164
摘要： A pulsed thermography defect detection apparatus including active and passive infrared (IR) thermography for non-destructive testing (NDT) of powdermetallic (P/M) components for on-line and off-line inspection.
摘要翻译： 一种脉冲热成像缺陷检测装置，包括用于在线和离线检查的粉末金属（P / M）部件的无损检测（NDT）的主动和被动红外（IR）热成像。
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公开(公告)号：WO2012018365A3
公开(公告)日：2013-07-25
申请号：PCT/US2011001174
申请日：2011-06-30
申请人： LAM RES CORP , SHAJII ALI , GOTTSCHO RICHARD , BENZERROUK SOUHEIL , COWE ANDREW , NAGARKATTI SIDDHARTH P , ENTLEY WILLIAM R
发明人： SHAJII ALI , GOTTSCHO RICHARD , BENZERROUK SOUHEIL , COWE ANDREW , NAGARKATTI SIDDHARTH P , ENTLEY WILLIAM R
IPC分类号： F16K31/12
CPC分类号： H01J37/32174 , H01J37/321 , H01J37/3244 , H01J37/32467 , H01J37/32642 , H01J37/3266 , H01J2237/334
摘要： A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber, multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites and multiple plasma chamber outlets coupling the plasma chamber to a process chamber. Each one of the plasma chamber outlets having a respective plasma restriction. A system and method for generating a plasma are also described.
摘要翻译： 等离子体源包括环等离子体室，围绕环等离子体室的外部的初级绕组，多个铁氧体，其中环等离子体室穿过将等离子体室耦合到处理室的每个铁氧体和多个等离子体室出口。 每个等离子体室出口具有相应的等离子体限制。 还描述了用于产生等离子体的系统和方法。
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10.发明申请
公开(公告)号：WO2012018367A2
公开(公告)日：2012-02-09
申请号：PCT/US2011/001176
申请日：2011-06-30
申请人： LAM RESEARCH CORPORATION , SHAJII, Ali , GOTTSCHO, Richard , BENZERROUK, Souheil , COWE, Andrew , NAGARKATTI, Siddharth, P. , ENTLEY, William, R.
发明人： SHAJII, Ali , GOTTSCHO, Richard , BENZERROUK, Souheil , COWE, Andrew , NAGARKATTI, Siddharth, P. , ENTLEY, William, R.
IPC分类号： H05H1/02
CPC分类号： H05H1/46 , H01J37/321 , H01J37/3211 , H01J37/32357 , H01J37/32422 , H01J37/3244 , H01J37/32449 , H01J37/3266 , H01J37/32669 , H01J37/32816 , H01J2237/334 , H05H2001/4652 , H05H2001/4682
摘要： A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described.
摘要翻译： 等离子体源包括环形等离子体室，围绕环形等离子体室外部的初级绕组以及多个铁氧体，其中环形等离子体室穿过每个铁氧体。 还描述了用于产生等离子体的系统和方法。
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