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    CONTAMINATION PREVENTION SYSTEM, LITHOGRAPHIC APPARATUS, RADIATION SOURCE AND DEVICE MANUFACTURING METHOD
    1.
    发明申请
    CONTAMINATION PREVENTION SYSTEM, LITHOGRAPHIC APPARATUS, RADIATION SOURCE AND DEVICE MANUFACTURING METHOD 审中-公开
    污染防治系统，光刻设备，辐射源及器件制造方法

    公开(公告)号：WO2008118009A1

    公开(公告)日：2008-10-02

    申请号：PCT/NL2008/050160

    申请日：2008-03-20

    Applicant: ASML NETHERLANDS B.V. ,  WASSINK, Arnoud Cornelis

    Inventor： WASSINK, Arnoud Cornelis

    IPC: G03F7/20 ,  G21K1/00 ,  G21K3/00

    CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70883

    Abstract: The invention relates to a contamination prevention system (71) comprising a rotatable channel barrier (72), which is driven by means of a suitable bearing (73,74). The contamination prevention system (71) according to the invention is arranged with a cooling system (75) provided substantially in a vicinity of the bearing (73). The cooling system (75) may comprise conducts (75a) through which a suitable fluid coolant, notably gas, is provided. It is possible that the gas is supplied via a central channel (79a) provided in a shaft of the contamination prevention system. Additionally, a supplementary cooling system (76) may be provided arranged with suitable conducts (76a). Because this cooling system (76) is arranged on the periphery of the contamination prevention system (71), it may use water as a suitable coolant. The invention further relates to a lithographic projection apparatus, a radiation source and a method of manufacturing an integrated structure.

    Abstract translation: 本发明涉及一种防污染系统（71），其包括可旋转的通道屏障（72），其通过合适的轴承（73,74）驱动。 根据本发明的防污染系统（71）布置有基本上设置在轴承（73）附近的冷却系统（75）。 冷却系统（75）可以​​包括导体（75a），通过该导管（75a）提供合适的流体冷却剂，特别是气体。 通过设置在防污染系统的轴中的中心通道（79a）可以供给气体。 此外，可以提供布置有适当导体（76a）的辅助冷却系统（76）。 由于该冷却系统（76）布置在防污染系统（71）的外围，因此可以使用水作为合适的冷却剂。 本发明还涉及光刻投影装置，辐射源和制造集成结构的方法。

    APPARATUS COMPRISING A ROTATING CONTAMINANT TRAP
    2.
    发明申请
    APPARATUS COMPRISING A ROTATING CONTAMINANT TRAP 审中-公开
    包含旋转污染物捕获装置的装置

    公开(公告)号：WO2008035965A3

    公开(公告)日：2008-05-29

    申请号：PCT/NL2007050451

    申请日：2007-09-17

    Applicant: ASML NETHERLANDS BV ,  FRANKEN JOHANNES CHRISTIAAN LE ,  BANINE VADIM YEVGENYEVICH ,  WASSINK ARNOUD CORNELIS

    Inventor： FRANKEN JOHANNES CHRISTIAAN LE ,  BANINE VADIM YEVGENYEVICH ,  WASSINK ARNOUD CORNELIS

    IPC: G03F7/20 ,  F16C32/06

    CPC classification number: G03F7/70916 ,  B82Y10/00 ,  F16C32/0603 ,  F16C32/0685 ,  F16C33/02 ,  F16C33/72 ,  F16C2300/62 ,  G03F7/70033 ,  G03F7/70941

    Abstract: A contaminant trap apparatus (10) arranged in a path (R) of a radiation beam to trap contaminants emanating from a radiation source (50) configured to produce the radiation beam is disclosed. The contaminant trap (10) apparatus includes a rotor (10) having a plurality of channel forming elements (11) defining channels (ch) which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor (10) including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source (50); and a bearing (20) configured to rotatably hold the rotor (10) with respect to a rotor carrying structure (30), wherein the apparatus is configured to (i) control or redirect an electrical discharge (10) of the rotor (ED), or (ii) suppress an electrical discharge (ED) of the rotor (10), or (iii) both,(i) and (ii).

    Abstract translation: 公开了布置在辐射束的路径（R）中的污染捕集装置（10），以捕获从被配置成产生辐射束的辐射源（50）发出的污染物。 污染物捕集器（10）装置包括具有多个通道形成元件（11）的转子（10），所述多个通道形成元件（11）限定了基本上平行于辐射束的传播方向布置的通道（ch），转子（10）包括电 可充电材料并且被布置成由于辐射源（50）的操作而被带电; 以及轴承（20），其构造成相对于转子承载结构（30）可旋转地保持所述转子（10），其中所述装置被配置为（i）控制或重定向所述转子（ED）的放电（10） ，或（ii）抑制转子（10）的放电（ED），或（iii）（i）和（ii）两者。

    APPARATUS COMPRISING A ROTATING CONTAMINANT TRAP
    7.
    发明申请
    APPARATUS COMPRISING A ROTATING CONTAMINANT TRAP 审中-公开
    包含旋转污染物捕获装置的装置

    公开(公告)号：WO2008035965A2

    公开(公告)日：2008-03-27

    申请号：PCT/NL2007/050451

    申请日：2007-09-17

    Applicant: ASML NETHERLANDS B.V. ,  FRANKEN, Johannes, Christiaan, Leonardus ,  BANINE, Vadim, Yevgenyevich ,  WASSINK, Arnoud, Cornelis

    Inventor： FRANKEN, Johannes, Christiaan, Leonardus ,  BANINE, Vadim, Yevgenyevich ,  WASSINK, Arnoud, Cornelis

    CPC classification number: G03F7/70916 ,  B82Y10/00 ,  F16C32/0603 ,  F16C32/0685 ,  F16C33/02 ,  F16C33/72 ,  F16C2300/62 ,  G03F7/70033 ,  G03F7/70941

    Abstract: A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii).

    Abstract translation: 公开了一种布置在辐射束的路径中的污染捕集装置，用于捕获从被配置成产生辐射束的辐射源发出的污染物。 污染物捕集装置包括具有多个通道形成元件的转子，该多个通道形成元件限定了基本上平行于辐射束的传播方向布置的通道，该转子包括可充电的材料并且被布置为由于操作而导致带电 辐射源; 以及构造成相对于转子承载结构可旋转地保持转子的轴承，其中所述装置被配置为（i）控制或重定向转子的放电，或（ii）抑制转子的放电或（ iii）（i）和（ii）。

    CONTAMINATION BARRIER AND LITHOGRAPHIC APPARATUS
    8.
    发明申请
    CONTAMINATION BARRIER AND LITHOGRAPHIC APPARATUS 审中-公开
    污染障碍物和光刻设备

    公开(公告)号：WO2007133072A1

    公开(公告)日：2007-11-22

    申请号：PCT/NL2007/050198

    申请日：2007-05-08

    Applicant: ASML NETHERLANDS B.V. ,  WASSINK, Arnoud, Cornelis

    Inventor： WASSINK, Arnoud, Cornelis

    IPC: G03F7/20

    CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166

    Abstract: A rotatable contamination barrier (1) is disclosed. The barrier includes a plurality of closely packed blades (5) for trapping contaminant material coming from an EUV radiation source (2). The blades are oriented radially relative to a central rotation axis of the contamination barrier. The contamination barrier is segmented in an inner segment (7) and an outer segment (8) relative to the central rotation axis. Accordingly, higher revolution speeds may be attained without compromising the contamination barrier.

    Abstract translation: 公开了一种可旋转的污染屏障（1）。 阻挡层包括用于捕获来自EUV辐射源（2）的污染物质的多个紧密堆积的叶片（5）。 叶片相对于污染屏障的中心旋转轴线径向定向。 污染屏障相对于中心旋转轴线在内部段（7）和外部段（8）中分段。 因此，可以在不损害污染屏障的情况下获得更高的转速。

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