ALIGNMENT SENSOR FOR LITHOGRAPHIC APPARATUS
    1.
    发明申请
    ALIGNMENT SENSOR FOR LITHOGRAPHIC APPARATUS 审中-公开
    对准装置的对准传感器

    公开(公告)号:WO2017045874A1

    公开(公告)日:2017-03-23

    申请号:PCT/EP2016/069876

    申请日:2016-08-23

    CPC classification number: G03F9/7065 G02B6/2938

    Abstract: A lithographic apparatus includes an alignment sensor configured to determine the position of an alignment target comprising a periodic structure. The alignment sensor includes a demultiplexer (700) to demultiplex a number of intensity channels (one of them shown to be output at fiber 702). The demultiplexer includes a number of stages arranged in series and a number of demultiplexing components (706, 708a,b, 710a-d,712a-h), each demultiplexing component being operable to divide an input radiation beam into two radiation beam portions. The first stage has a first demultiplexing component (706) that is arranged to receive as an input radiation beam an incident radiation beam. Each successive stage is arranged such that it has twice the number of demultiplexing components as a preceding stage, each demultiplexing component of each stage after the first stage receiving as an input one of the radiation beam portions output from a demultiplexing component of the preceding stage.

    Abstract translation: 光刻设备包括配置成确定包括周期性结构的对准目标位置的对准传感器。 对准传感器包括解复用器(700),以解复用多个强度通道(其中一个示出为在光纤702处输出)。 解复用器包括串联布置的多个级和多个解复用组件(706,708a,b,710a-d,712a-h),每个解复用组件可操作以将输入辐射束分成两个辐射束部分。 第一级具有布置成作为输入辐射束接收入射辐射束的第一解复用部件(706)。 每个连续级被布置为使得其具有前一级的解复用分量的两倍,在第一级接收之后的每级的每个解复用分量作为从前一级的解复用分量输出的辐射束部分中的输入一个。

Patent Agency Ranking