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公开(公告)号：WO2023014565A1
公开(公告)日：2023-02-09
申请号：PCT/US2022/038623
申请日：2022-07-28
Applicant: FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
Inventor： HUANG, Ting-Kai , HU, Bin , LIANG, Yannan , PIAO, Hong
IPC: C09G1/04 , H01L21/321 , B24B37/04
Abstract: This disclosure relates to a composition that includes at least one first ruthenium removal rate enhancer; at least one copper removal rate inhibitor; at least one low-k removal rate inhibitor; and an aqueous solvent.
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