公开(公告)号：WO03016781A3

公开(公告)日：2003-09-18

申请号：PCT/US0226072

申请日：2002-08-14

Applicant: HARVARD COLLEGE ,  STARK PETER RANDOLPH HAZARD ,  LARSON DALE N

Inventor： STARK PETER RANDOLPH HAZARD ,  LARSON DALE N

IPC: A61K31/428 ,  G01N21/55 ,  G01Q10/00 ,  G01Q30/20 ,  G01Q60/18 ,  G02B21/00 ,  G03F7/20 ,  G21K1/00 ,  G21K5/04 ,  H05H6/00 ,  C25D11/02 ,  G01N33/543 ,  H01L27/12

CPC classification number: A61K31/428 ,  G01N21/554 ,  G01N21/648 ,  G01Q60/22 ,  G02B21/004 ,  G02B21/0068 ,  G02B21/0072 ,  G02B21/0076 ,  G03F7/70375 ,  G03F7/70483 ,  G21K1/00 ,  G21K5/04 ,  H01J2237/3174 ,  H05H6/00 ,  Y10T29/49 ,  Y10T29/49002 ,  Y10T436/11

Abstract: Methods and apparatus for producing small, bright nanometric light sources from apertures that are smaller than the wavelength of the emitted light. Light 437 is directed at a surface layer 435 of metal onto a light barrier structure that includes one or more apertures each of which directs a small spot of light onto a target. The incident light excites surface plasmons 452 "electron density fluctuations" in the top metal surface layer and this energy couples through the apertures to the opposing surface where it is emitted as light from the apertures of from the rims of the apertures. Means are employed to prevent or severely limit the extent to which surface plasmons are induced on the surface at the aperture exit, thereby constraining the resulting emissions to small target areas. The resulting small spot illunination may be used to increase the resolution, photolithographic processes, and storage capacity of microscopes.

Abstract translation: 用于从小于发射光的波长的孔产生小的，明亮的纳米光源的方法和装置。 光437被引导到金属的表面层435到包括一个或多个孔的光阻挡结构，每个孔将小的光斑引导到靶上。 入射光激发顶部金属表面层中的表面等离子体激元452“电子密度波动”，并且该能量通过孔耦合到相对表面，在该相对表面处，其作为光从孔的边缘的光发射。 采用手段来防止或严重限制在孔口处的表面上诱导表面等离子体激元的程度，从而将所得到的排放物约束到小目标区域。 所产生的小点染色可用于增加显微镜的分辨率，光刻工艺和存储容量。

公开(公告)号：WO2007081913A2

公开(公告)日：2007-07-19

申请号：PCT/US2007000458

申请日：2007-01-05

Applicant: HARVARD COLLEGE ,  STARK PETER RANDOLPH HAZARD

Inventor： STARK PETER RANDOLPH HAZARD

IPC: G01Q60/22

CPC classification number: G02B5/008 ,  G01Q60/22 ,  G02B6/1226 ,  G02B21/0072 ,  G02F2203/12 ,  G03F7/70383 ,  H01S5/18305 ,  H01S5/18388 ,  H01S5/423

Abstract: Methods and apparatus in which a plurality of independently controllable surface emitting lasers (SELs) are controlled to generate radiation that irradiates a plurality of surface plasmon enhanced illumination (SPEI) apparatus. The irradiated SPEI apparatus in turn generate surface plasmon enhanced radiation that may be employed for a variety of applications, including maskless (i.e., "direct write") photolithography techniques in which a photoresist is exposed to individually controllable beams of surface plasmon enhanced radiation.

Abstract translation: 其中控制多个可独立控制的表面发射激光器（SEL）以产生照射多个表面等离子体增强照明（SPEI）设备的辐射的方法和装置。 照射的SPEI装置又产生表面等离子体增强辐射，其可用于包括无掩模（即“直接写入”）光刻技术的各种应用，其中光致抗蚀剂暴露于表面等离子体增强辐射的独立可控光束。