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    A MIXED SOLVENT SYSTEM FOR POSITIVE PHOTORESISTS
    1.
    发明申请
    A MIXED SOLVENT SYSTEM FOR POSITIVE PHOTORESISTS 审中-公开
    一种用于正电子照相的混合溶剂系统

    公开(公告)号：WO1997023808A2

    公开(公告)日：1997-07-03

    申请号：PCT/US1996019953

    申请日：1996-12-17

    Applicant: HOECHST CELANESE CORPORATION

    Inventor： HOECHST CELANESE CORPORATION ,  WANAT, Stanley, F. ,  RAHMAN, M., Dalil ,  KHANNA, Dinesh, N. ,  AUBIN, Daniel, P. ,  DIXIT, Sunit, S.

    IPC: G03C00/00

    CPC classification number: G03F7/0048 ,  G03F7/022 ,  G03F7/0236

    Abstract: A positive working photosensitive composition suitable for use as a photoresist, which comprises an admixture of at least one water insoluble, aqueous alkali soluble, film forming novolak resin; at least one o-diazonaphthoquinone photosensitizer; and a photoresist solvent mixture comprising a propylene glycol alkyl ether acetate and 3-methyl-3-methoxy butanol and process for producing such a composition.

    Abstract translation: 适合用作光致抗蚀剂的正性感光性组合物，其包含至少一种不溶于水的碱溶性水溶性成膜酚醛清漆树脂的混合物; 至少一种邻二氮萘醌光敏剂; 以及包含丙二醇烷基醚乙酸酯和3-甲基-3-甲氧基丁醇的光致抗蚀剂溶剂混合物及其制备方法。

    POSITIVE PHOTOSENSITIVE COMPOSITION
    7.
    发明申请
    POSITIVE PHOTOSENSITIVE COMPOSITION 审中-公开
    正性感光组合物

    公开(公告)号：WO1996012988A1

    公开(公告)日：1996-05-02

    申请号：PCT/US1995012719

    申请日：1995-10-12

    Applicant: HOECHST CELANESE CORPORATION

    Inventor： HOECHST CELANESE CORPORATION ,  RAHMAN, M., Dalil ,  AUBIN, Daniel, P.

    IPC: G03F07/022

    CPC classification number: G03F7/022 ,  G03F7/0046

    Abstract: A photosensitizer comprising a diazo ester of structure (I) wherein: X = Cl, Br, I, OH, OR, COOR, COOAr(OH)n, COAr(OH)n, COR, R, Ar(OH)n; R = C1-C8 alkyl, n = 0 to 5, Ar = phenyl, as the backbone, where at least one of the hydroxy groups on phenyl ring has been esterified with diazo-sulfonyl chloride comprising 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride, or a mixture thereof, and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition and a suitable solvent.

    Abstract translation: 包含结构式（I）的重氮酯的光敏剂，其中：X = Cl，Br，I，OH，OR，COOR，COOAr（OH）n，COAr（OH）n，COR，R，Ar（OH） R = C 1 -C 8烷基，n = 0至5，Ar =苯基，作为主链，其中苯环上的至少一个羟基已经被重氮磺酰氯酯化，所述重氮磺酰氯包含60至100摩尔％ 4或2,1,5-重氮磺酰氯或其混合物，以及光致抗蚀剂，其包含光致抗蚀剂组合物中以足以使光致抗蚀剂组合物均匀光敏的量的光敏剂的混合物; 水不溶性的碱溶性酚醛清漆树脂，酚醛清漆树脂以足以形成基本均匀的光致抗蚀剂组合物和合适溶剂的量存在于光致抗蚀剂组合物中。

    USING A LEWIS BASE TO CONTROL MOLECULAR WEIGHT OF NOVOLAK RESINS
    8.
    发明申请
    USING A LEWIS BASE TO CONTROL MOLECULAR WEIGHT OF NOVOLAK RESINS 审中-公开
    使用LEWIS基础控制NOVOLAK树脂的分子量

    公开(公告)号：WO1994014862A1

    公开(公告)日：1994-07-07

    申请号：PCT/US1993012403

    申请日：1993-12-20

    Applicant: HOECHST CELANESE CORPORATION

    Inventor： HOECHST CELANESE CORPORATION ,  RAHMAN, M., Dalil ,  AUBIN, Daniel, P. ,  DURHAM, Dana, L. ,  DAMMEL, Ralph, R.

    IPC: C08G08/10

    CPC classification number: C08G8/08 ,  G03F7/0236

    Abstract: The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a precise and consistent molecular weight, by adjusting the concentration of Lewis base. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.

    Abstract translation: 本发明提供了通过调节路易斯碱的浓度来制备具有精确和一致分子量的水不溶性水溶性酚醛清漆树脂的方法。 还提供了用于由这种酚醛清漆树脂制造光致抗蚀剂组合物并用于制备使用这种光致抗蚀剂组合物的半导体器件的方法。

    ACIDIC ION EXCHANGE RESIN AS A CATALYST TO SYNTHESIZE A NOVOLAK RESIN AND PHOTORESIST COMPOSITION THEREFROM
    9.
    发明申请
    ACIDIC ION EXCHANGE RESIN AS A CATALYST TO SYNTHESIZE A NOVOLAK RESIN AND PHOTORESIST COMPOSITION THEREFROM 审中-公开
    ACIDIC离子交换树脂作为催化剂合成NOVOLAK树脂和其中的光电组合物

    公开(公告)号：WO1997025359A1

    公开(公告)日：1997-07-17

    申请号：PCT/US1996020165

    申请日：1996-12-17

    Applicant: HOECHST CELANESE CORPORATION

    Inventor： HOECHST CELANESE CORPORATION ,  RAHMAN, M., Dalil ,  AUBIN, Daniel, P. ,  KOKINDA, Elaine, G. ,  DURHAM, Dana, L.

    IPC: C08G08/10

    CPC classification number: C08G8/10 ,  G03F7/0236

    Abstract: The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having consistent molecular weight and a very low level of metal ions, utilizing a solid acid condensation catalyst. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.

    Abstract translation: 本发明提供了利用固体酸缩合催化剂生产具有一致分子量和非常低水平的金属离子的水不溶性水溶性酚醛清漆树脂的方法。 还提供了一种用于生产具有来自这种酚醛清漆树脂的非常低水平的金属离子并且使用这种光致抗蚀剂组合物制造半导体器件的光致抗蚀剂组合物的方法。

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