GUARD RING DESIGN ENABLING IN-LINE TESTING OF SILICON BRIDGES FOR SEMICONDUCTOR PACKAGES
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    发明申请
    GUARD RING DESIGN ENABLING IN-LINE TESTING OF SILICON BRIDGES FOR SEMICONDUCTOR PACKAGES 审中-公开
    GUARD RING DESIGN能够实现半导体封装的硅桥在线测试

    公开(公告)号:WO2017074391A1

    公开(公告)日:2017-05-04

    申请号:PCT/US2015/058072

    申请日:2015-10-29

    Abstract: Guard ring designs enabling in-line testing of silicon bridges for semiconductor packages, and the resulting silicon bridges and semiconductor packages, are described. In an example, a semiconductor structure includes a substrate having an insulating layer disposed thereon. A metallization structure is disposed on the insulating layer. The metallization structure incudes conductive routing disposed in a dielectric material stack. The semiconductor structure also includes a first metal guard ring disposed in the dielectric material stack and surrounding the conductive routing. The first metal guard ring includes a plurality of individual guard ring segments. The semiconductor structure also includes a second metal guard ring disposed in the dielectric material stack and surrounding the first metal guard ring. Electrical testing features are disposed in the dielectric material stack, between the first metal guard ring and the second metal guard ring.

    Abstract translation: 描述了保护环设计,其能够在线测试用于半导体封装的硅桥以及由此产生的硅桥和半导体封装。 在一个示例中,半导体结构包括其上设置有绝缘层的衬底。 金属化结构设置在绝缘层上。 金属化结构包括设置在电介质材料堆叠中的导电布线。 半导体结构还包括设置在介电材料堆叠中并且围绕导电布线的第一金属保护环。 第一金属保护环包括多个单独的保护环段。 半导体结构还包括设置在介电材料堆叠中并且围绕第一金属保护环的第二金属保护环。 电气测试特征设置在介电材料叠层中,在第一金属保护环和第二金属保护环之间。

    ELECTROLESS METAL-DEFINED THIN PAD FIRST LEVEL INTERCONNECTS FOR LITHOGRAPHICALLY DEFINED VIAS

    公开(公告)号:WO2019066977A1

    公开(公告)日:2019-04-04

    申请号:PCT/US2017/054638

    申请日:2017-09-29

    Abstract: A package substrate, comprising a package comprising a substrate, the substrate comprising a dielectric layer, a via extending to a top surface of the dielectric layer; and a bond pad stack having a central axis and extending laterally from the via over the first layer. The bond pad stack is structurally integral with the via, wherein the bond pad stack comprises a first layer comprising a first metal disposed on the top of the via and extends laterally from the top of the via over the top surface of the dielectric layer adjacent to the via. The first layer is bonded to the top of the via and the dielectric layer, and a second layer is disposed over the first layer. A third layer is disposed over the second layer. The second layer comprises a second metal and the third layer comprises a third metal. The second layer and the third layer are electrically coupled to the via.

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