公开(公告)号：WO2021141835A1

公开(公告)日：2021-07-15

申请号：PCT/US2021/012022

申请日：2021-01-04

Applicant: KLA CORPORATION

Inventor： JIANG, Xuguang ,  RHA, JuHwan

IPC: H01L21/66 ,  G01N21/88 ,  G01N21/95 ,  H01L21/67 ,  G01N2021/8887 ,  G01N21/8851 ,  G01N21/9505 ,  G01N2201/06113 ,  G06T2207/30148 ,  G06T7/0004 ,  G06T7/11 ,  G06T7/136

Abstract: A projection is determined in a semiconductor image, which can be an X projection and/or a Y projection. At least one threshold is applied to the projection thereby forming at least one segment within the region. A fine segment can be determined in the region using a distance value from the projection. Defect detection can be performed in one of the fine segments.