SYSTEM AND METHOD FOR MONITORING PARAMETERS OF A SEMICONDUCTOR FACTORY AUTOMATION SYSTEM
    1.
    发明申请
    SYSTEM AND METHOD FOR MONITORING PARAMETERS OF A SEMICONDUCTOR FACTORY AUTOMATION SYSTEM 审中-公开
    用于监测半导体工厂自动化系统参数的系统和方法

    公开(公告)号:WO2016205075A1

    公开(公告)日:2016-12-22

    申请号:PCT/US2016/036751

    申请日:2016-06-09

    Abstract: A system for monitoring one or more conditions of an automation system of a semiconductor factory includes one or more instrumented substrates, one or more sealable containers and one or more system servers. The one or more instrumented substrates include one or more sensors. The one or more sensors measure one or more conditions of the one or more instrumented substrates as the one or more sealable containers transport the one or more instrumented substrates through the semiconductor factory. The one or more sealable containers also receive sensor data from the one or more sensors included on the one or more instrumented substrates. The one or more system servers are configured to receive the sensor data from the one or more sealable containers. The one or more servers are configured to identify one or more deviations in the measured one or more conditions.

    Abstract translation: 用于监测半导体工厂的自动化系统的一个或多个条件的系统包括一个或多个仪表化基板,一个或多个可密封容器和一个或多个系统服务器。 一个或多个被检测的基底包括一个或多个传感器。 当一个或多个可密封的容器通过半导体工厂运输一个或多个被检测的基底时,一个或多个传感器测量一个或多个被检测的基底的一个或多个条件。 所述一个或多个可密封的容器还接收来自所述一个或多个被检测基底上的一个或多个传感器的传感器数据。 一个或多个系统服务器被配置为从一个或多个可密封容器接收传感器数据。 一个或多个服务器被配置为识别所测量的一个或多个条件中的一个或多个偏差。

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