公开(公告)号：WO2021030364A1

公开(公告)日：2021-02-18

申请号：PCT/US2020/045794

申请日：2020-08-11

Applicant: LAM RESEARCH CORPORATION

Inventor： KUMAR, Purushottam ,  MIAO, Tengfei ,  JIANG, Gengwei ,  HO, Daniel ,  ABEL, Joseph R. ,  ATTUR, Siddappa ,  AGARWAL, Pulkit

IPC: C23C16/455 ,  C23C16/52

Abstract: Methods and system are provided for dynamic process control in substrate processing, for example in semiconductor manufacturing applications. Some example systems and methods are provided for advanced monitoring and machine learning in atomic layer deposition (ALD) processes. Some examples also relate to dynamic process control and monitoring for chamber parameter matching and gas line charge times.