REMOVAL OF ORGANICALLY MODIFIED SILICATE FILMS FROM METAL SUBSTRATES
    2.
    发明申请
    REMOVAL OF ORGANICALLY MODIFIED SILICATE FILMS FROM METAL SUBSTRATES 审中-公开
    从金属基底去除有机改性的硅酸盐膜

    公开(公告)号:WO2003023088A1

    公开(公告)日:2003-03-20

    申请号:PCT/US2002/028562

    申请日:2002-09-09

    CPC classification number: C09D9/00 C23G1/14 C23G1/22

    Abstract: A process for chemical removal of organically- modified silicate (Ormosil) coatings from aluminum alloy substrates without degradation of the underlying metal. An Ormosil film is treated with a zincate solution. The zincate solution dissolves the Ormosil film and deposits a thin, easily-removed layer of zinc onto the aluminum alloy surface, which prevents base-activated dissolution of the underlying metal. The zinc layer may be removed using dilute phosphoric acid, leaving the surface of the aluminum alloy intact. Consequently, the sol-gel coating may be removed while the integrity of the aluminum alloy substrate is maintained.

    Abstract translation: 用于从铝合金基材中化学去除有机改性硅酸盐(Ormosil)涂层的过程,而不会降解底层金属。 用硫酸锌溶液处理Ormosil膜。 锌酸盐溶液溶解Ormosil膜,并在铝合金表面上沉积一层薄而易去除的锌层,防止底层金属的碱激活溶解。 可以使用稀磷酸将锌层除去,使铝合金的表面保持完整。 因此,可以在保持铝合金基板的完整性的同时去除溶胶 - 凝胶涂层。

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