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发明授权
CN101010793B 制造具有通过纳米线接触的导电材料层的电子器件的方法 失效 - 权利终止 转让

制造具有通过纳米线接触的导电材料层的电子器件的方法
摘要：
根据本发明的电子器件(100)包括电阻率可在第一值和第二值之间切换的存储材料层(107)。存储材料可以是相变材料。该电子器件(100)还包括一组纳米线(NW)，电连接该电子器件(100)的第一端子(172)与存储材料层(107)，从而使得能够从第一端子通过纳米线(NW)和存储材料层(107)向电子器件的第二端子(272)传导电流。每一纳米线(NW)在各自的接触面积与存储材料层(107)电接触。所有接触面积实质上相同。根据本发明的方法适于制造根据本发明的电子器件(100)。
摘要（英）：

The electric device (100) according to the invention comprises a layer (107) of a memory material which has an electrical resistivity switchable between a first value and a second value. The memory material may be a phase change material. The electric device (100) further comprises a set of nanowires (NW) electrically connecting a first terminal (172) of the electric device and the layer (107) ofmemory material thereby enabling conduction of an electric current from the first terminal via the nanowires (NW) and the layer (107) of memory material to a second terminal (272) of the electric device. Each nanowire (NW) electrically contacts the layer (107) of memory material in a respective contact area. All contact areas are substantially identical. The method according to the invention is suited to manufacture the electric device (100) according to the invention.

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