利索-全球专利检索

  1. 登录
  2. 注册
发明公开
CN101059206A 用以降低高压气体存储和输送带来的危险的压力气体输送系统和方法 无效 - 驳回 转让 复审申请

用以降低高压气体存储和输送带来的危险的压力气体输送系统和方法
摘要：
本发明公开了一种用于分配气体的组件，包括：调压气体源容器，该调压气体源容器适于容纳高于大气压的流体且设置成在基本低压下排气；集成气管，该集成气管适于接收来自调压气体源容器的排气且包括用以分配该排气的气体流路；以及至少一个选自以下部件的其他部件：用于可选择地将集成气管的流路和调压气体源容器相隔开的装置；和用于从气体流路中去掉气体、以能够在容器内气体已经消耗到预定程度时可更换气体源容器的装置。
摘要（英）：

Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.

0/0