The invention discloses a supporting device for a substrate, comprising four first supporting pedestals, at least one second supporting pedestal and a pedestal, wherein, the four supporting pedestals support one of first blank spaces and second blank spaces of the substrate; the at least one second supporting pedestal supports one of the first blank spaces of the substrate; and the pedestal is provided with the first supporting pedestals and the second supporting pedestal. The substrate is prevented from being damaged or fragmentized and a panel area of the substrate is prevented from generating problems such as chromatic aberration and so on during the chemical vapor deposition manufacturing procedure through the given arrangement of the first supporting pedestals and the second supporting pedestal, and the panel design of different dimensions can be directly corresponded without the necessity of changing the positions of the supporting pedestals.