The invention relates to a magnetron sputtering target for filming previous metals, comprising a target seat with a fixed target backboard. The periphery of the top surface of the target backboard is provided with a permanent-magnet frame comprising target-edge permanent magnets, and the middle of the permanent-magnet frame is provided with a target-middle permanent magnet, a corresponding target-edge magnetic pole is arranged above the permanent-magnet frame, and a corresponding target-middle magnetic pole is arranged above the target-middle permanent magnet; the target-edge magnetic pole and the permanent-magnet frame, and the target-middle magnetic pole and the target-middle permanent magnet are respectively separated and coupled by a water-cooling board, and a target surface which is in a frame structure and is fixed on the water-cooling board by target strip clamps is arranged between the target-edge magnetic pole and the target-middle magnetic pole. The invention can remarkably reduce the weight of a target material, improve the utilization rate of the target material, decrease the production cost and facilitate the recovery and storage of the target material.