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CN101684544A 光介质用溅射靶及其制造方法、和光介质及其制造方法 有权

光介质用溅射靶及其制造方法、和光介质及其制造方法
摘要：
本发明提供光介质用溅射靶及其制造方法、和光介质及其制造方法。光介质用溅射靶以Al为主成分，并含有1～10at％的选自Ta和Nb中的1种或2种元素、以及0.1～10at％的Ag。光介质(100)包括基板(10)和反射层(20A、20B)，该反射层(20A、20B)设置在基板(10)上，并具有以Al为主成分、且含有1～10at％的选自Ta和Nb中的1种或2种元素、以及0.1～10at％的Ag的组成。
摘要（英）：

A sputtering target for optical media is mainly composed of Al and contains 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag. Anoptical medium 100 comprises a substrate 10 and reflective layers 20A, 20B provided on the substrate 10. Each of the reflective layers 20A, 20B has a composition, mainly composed of Al, containing 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag.

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