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发明公开
CN101742807A 一种等离子发生装置及等离子处理装置 无效 - 驳回

一种等离子发生装置及等离子处理装置
摘要：
本发明提供一种等离子发生装置。此装置包括：绝缘板(Smn)，沿第一方向及跨过第一方向的第二方向以矩阵形式排列；金属上板，包括其上设置绝缘板并具有四角形形状的贯通孔(Hmn)；天线结构体(Tmn)，设置于各绝缘板上。天线结构体包括：第一型天线结构体，接近于金属上板的边缘而设置；第二型天线结构体，接近于金属上板的边而设置；其中，第一型天线结构体比第二型天线结构体消耗更多的电力，从而可形成均匀等离子。
摘要（英）：

The present invention provides a plasma generation apparatus which comprises the following components: insulation plates (Smn) which are arranged along a first direction and a second direction crossed with the first direction with a rectangular form; a metal upper plate which comprises the insulation plates and is provided with quadrangular through holes (Hmn); and antenna structures (Tmn) which are provided on the insulation plates. The antenna structures (Tmn) comprises the following components: first antenna structures which are provided next to the corners of the metal upper plate; second antenna structures which are equipped with a mode that one edge of each antenna structure is next to the edge of the metal upper plate; wherein, the first antenna structures consume more power than the second antenna structures thereby forming uniform plasma.

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