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发明公开
CN101939262A 超纯水制造方法和装置以及电子部件构件类的清洗方法和装置 无效 - 驳回

超纯水制造方法和装置以及电子部件构件类的清洗方法和装置
摘要：
本发明提供能稳定地制造硼浓度为1ng/L以下或金属浓度为0.1ng/L以下的超纯水制造装置、使用该超纯水制造装置的超纯水制造方法、电子部件构件类的清洗方法和清洗装置。超纯水制造装置，其中设置有具备阴离子交换树脂和阳离子交换树脂的混床式脱离装置16作为最后段的脱离子装置，作为该阴离子交换树脂，使用确认硼含量为50μg/L-阴离子交换树脂(湿润状态)以下的阴离子交换树脂或者阳离子洗脱量为100μg/L-阴离子交换树脂(湿润状态)的阴离子交换树脂。
摘要（英）：

This invention provides an apparatus for producing ultrapure water, which can stably produce ultrapure water having a boron concentration of not more than 1 ng/L or a metal concentration of not more than 0.1 ng/L, a process for producing ultrapure water using the apparatus, a method for cleaning electronic component members, and an apparatus for cleaning electronic component members. The apparatus for producing ultrapure water comprises a mixed bed deionization apparatus (16), provided with an anion exchange resin and a cation exchange resin, as a lattermost deionization apparatus. The anion exchange resin is an anion exchange resin having a boron content of not more than 50 [mu]g/L-anion exchange resin (wet state) or an anion exchange resin having a cation elution amount of 100 [mu]g/L-anion exchange resin (wet state).

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