The invention discloses a method for prolonging queue time, which comprises the following steps of: performing copper chemical mechanical polishing treatment on the deposited metal layer; performing surface treatment on a wafer subjected to the copper chemical mechanical polishing treatment by using alkaline organic solution, and cleaning by using deionized water; and generating a silicon nitridelayer on the cleaned wafer. Through the method, the queue time in the process of manufacturing semiconductor devices can be effectively prolonged, the yield of the product is improved and the processcost is saved.