The invention relates to the field of preparation of glass coated target materials, in particular to a glass coated target material and a preparation method thereof, which solve the problem of preparation of magnetron sputtering glass coated target materials. The glass coated target material is prepared from SiAl powder serving as a raw material which is prepared by mechanically mixing pure Si powder and pure Al powder, wherein the mixed powder comprises 85 to 95 weight percent of Si powder with particle diameter of between 45 and 125 mu m and 5 to 15 weight percent of Al powder with particlediameter of between 30 and 100 mu m. The glass coated target material is prepared by atmospheric plasma spray coating technology; and the preparation process parameters are that: the current is 400 to 500A, the voltage is 45 to 58V, the powder feed rate is 40 to 60g/minute, the powder feed air flow is 5.0 to 7.0L/minute, the main air flow is 41 to 43L/minute, the main air pressure is 0.45 to 0.55MPa, the secondary air flow is 1.6 to 2.8L/minute, the secondary air pressure is 0.25 to 0.35MPa, the spray coating distance is 100 to 150mm, and the spray coating angle is 75 to 90 degrees. The sputtering cathode target material prepared by the method is suitable for production of coated glass and has great industrial application value.