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发明公开
CN102076880A 蒸镀装置及薄膜装置的制造方法 失效 - 权利终止

蒸镀装置及薄膜装置的制造方法
摘要：
本发明提供一种能够抑制成膜条件的经时变化的蒸镀装置(1)。所述蒸镀装置(1)具备：被支承在接地的真空容器(10)内的基板支架(12)、保持在基板支架(12)上的基板(14)、离开基板(14)并与基板(14)相向的蒸发源(34，36)、对基板(14)照射离子的离子枪(38)、以及对基板(14)照射电子的中和器(40)，其中，真空容器(10)具备与真空容器(10)电气悬浮的内壁(30)，中和器(40)配设在真空容器(10)的内侧侧面侧并离开离子枪(38)。
摘要（英）：

The issue is to provide a vapor deposition device (1) that can limit changes in film-formation conditions over time. The vapor deposition device (1) is provided with a substrate holder (12) that is supported inside a grounded vacuum container (10), a substrate (14) that is held in the substrate holder (12), vapor-generating sources (34, 36) that face the substrate (14) at a distance, an ion gun (38) that irradiates the substrate (14) with ions, and a neutralizer (40) that irradiates the substrate (14) with electrons. The vacuum container (10) is provided with an inner wall (30) that is electrically floated from the vacuum container (10), and the neutralizer (40) is disposed on the inside wall surface of the vacuum container (10) at a distance from the ion gun (38).

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