The invention relates to a manufacturing method of high-purity copper targets, comprising the steps of: providing a copper material with original thickness; carrying out cold rolling on the copper material to prepare an objective copper target; and carrying out heat treatment on the objective copper target, wherein the cold rolling step comprises the steps of first cold rolling with the first cold rolling quantity, second cold rolling with the second cold rolling quantity and third cold rolling with the third cold rolling quantity, and the first cold rolling quantity, the second cold rolling quantity and the third cold rolling quantity are reduced in sequence. Through control of the cold rolling quantity, the angle of the copper material, the temperature of heat treatment and the time of heat treatment, the high-purity copper target which has appropriate size and is internally provided with crystal particles of the size meeting requirements is obtained.