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发明公开
CN102395708A 蚀刻剂组合物和方法 有权 转让

蚀刻剂组合物和方法
摘要：
本发明提供了蚀刻剂组合物以及使用所述组合物蚀刻基板的方法，所述组合物包含：A)提供约0.025重量％至约0.8重量％活性氧的高浓度过一硫酸氢钾；B)按所述组合物的重量计约0.01％至约30％的B1)有机酸、有机酸的碱金属盐、有机酸的铵盐、或有机酸的均聚物，或B2)四唑或苯的卤盐或硝酸盐，或B3)组分B1)和B2)的混合物；和C)按所述组合物的重量计约0％至约97.49％的水。
摘要（英）：

The present invention provides an etchant composition comprising A) high strength potassium monopersulfate providing from about 0.025% to about 0.8% by weight of active oxygen; B) from about 0.01% to about 30% by weight of the composition of B1) an organic acid, alkali metal salt of an organic acid, ammonium salt of an organic acid, or a homopolymer of an organic acid, or B2) a halogen or nitrate salt of phosphonium, tetrazolium, or benzolium, or B3) a mixture of component B1) and B2); and C) from about 0% to about 97.49% by weight of the composition of water; and a method of etching a substrate using said composition.

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