The invention discloses a method for manufacturing an array substrate of an active matrix organic light-emitting display. The method comprises the following steps of: providing a substrate; forming a TFT (Thin Film Transistor) on the substrate; continuously depositing a passivation layer on the substrate to cover a source electrode and a drain electrode; forming a photoresist layer on the passivation layer, etching to form a first contact hole exposing the source electrode and the drain electrode, and removing the residual photoresist layer; continuously forming a photosensitive or etching organic planarization layer on the first contact hole, and exposing the organic planarization layer, wherein an exposing mask is a regional light-transmitting mask, the position of the first contact hole is fully exposed, a pixel electrode region A is half exposed, and residual regions are unexposed; finally, forming a pixel electrode on the whole surface of the substrate. Through the method for manufacturing the array substrate of the active matrix organic light-emitting display, disclosed by the invention, the current two times of planarization process is reduced to one time of planarization process, thus one mask process is reduced and the cost can be effectively reduced.