The invention discloses a device for continuously preparing two-dimensional nano films. The device is characterized in that: a feeding chamber, a first treatment chamber, a first balancing chamber, a film preparation chamber, a second balancing chamber, a second treatment chamber and a discharge chamber are sequentially arranged on a production line; a heating device is arranged in at least one of the feeding chamber, the first treatment chamber, the film preparation chamber, the second treatment chamber and the discharge chamber; a valve, a vacuum system and a gas pipeline are arranged between every two chambers, and a sample is transmitted among the chambers through a sample conveying device; and the film preparation chamber is provided with a film deposition system. The device is simple in structure and reliable in work, can be used for continuously preparing uniform two-dimensional nano films of graphene, transition metal sulfides, silylene, germanium alkene or boron nitride and the like in large area, and adapts to industrialized preparation of the two-dimensional nano films.