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发明公开
CN102877039A 气相沉积装置和方法以及制造有机发光显示装置的方法 有权

气相沉积装置和方法以及制造有机发光显示装置的方法
摘要：
本发明提供了一种能够执行薄膜沉积工艺并提高所形成的薄膜的特性的气相沉积装置、一种气相沉积方法和一种制造有机发光显示装置的方法，所述气相沉积装置包括：室，具有排放开口；架台，设置在所述室内，并包括安装表面，所述基底可以安装在所述安装表面上；注入单元，具有至少一个注入开口，所述至少一个注入开口用于将气体沿与所述基底的其上将形成所述薄膜的表面平行的方向注入到所述室内；引导构件，面向所述基底，以在所述基底和所述引导构件之间提供设定的或预定的空间；驱动单元，用于传送所述架台和所述引导构件。
摘要（英）：

A vapor deposition apparatus, which is capable of performing a thin film deposition process and improving characteristics of a formed thin film, includes: a chamber having an exhaust opening; a stage disposed in the chamber, and comprising a mounting surface on which the substrate may be mounted; an injection unit having at least one injection opening for injecting a gas into the chamber in a direction parallel with a surface of the substrate, on which the thin film is to be formed; a guide member facing the substrate to provide a set or predetermined space between the substrate and the guide member; and a driving unit conveying the stage and the guide member.

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