The invention discloses the technical field of semiconductor manufacturing and particularly relates to a chamber airflow control system and a method. The chamber airflow control system comprises a PCC (Program-Controlled Computer) controller and at least one chamber control unit, wherein the chamber control unit comprises a pressure sensor, a fan filter, a state detection unit connected with the fan filter, a data processing unit connected with the pressure sensor, the fan filter and the state detection unit and a data transmission unit connected with the data processing unit. The chamber airflow control system and the method have the beneficial effect that gas pressure in a chamber can be controlled in real time, so that the gas pressure in the chamber is maintained within a set value.