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发明公开
CN103367110A 基板处理方法以及基板处理装置 有权

基板处理方法以及基板处理装置
摘要：
本发明提供一种基板处理方法和基板处理装置，基板处理方法包括：冲洗工序，对硅基板的表面供给第一温度的水，利用该水对所述硅基板的表面实施冲洗处理；第二温度水供给（涂敷）工序，在所述冲洗工序之后，对所述硅基板的表面供给比所述第一温度低的第二温度的水；干燥工序，在所述第二温度水供给工序之后，使所述硅基板旋转，从而将该硅基板的表面的水甩向硅基板的周围，使所述硅基板干燥。
摘要（英）：

The invention provides a substrate processing method and a substrate processing apparatus. The substrate processing method includes a rinsing step of supplying water of a first temperature to a surface of a silicon substrate to apply a rinsing process using the water to the silicon substrate surface, a second temperature water supplying (coating) step of supplying water of a second temperature lower than the first temperature to the silicon substrate surface after the rinsing step, and a drying step of rotating the silicon substrate after the second temperature water supplying step to spin off the water on the silicon substrate surface to a periphery of the silicon substrate and thereby dry the silicon substrate.

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