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Invention Publication
CN103887130A 磁控管以及应用该磁控管的磁控溅射设备 有权

磁控管以及应用该磁控管的磁控溅射设备
Abstract:
本发明提供一种磁控管和磁控溅射设备，包括极性相反的外磁极和内磁极，其中，在垂直于所述磁控管的径向截面上，所述内磁极为由两段螺旋线首尾串接而形成的不对称的闭合环形，且该螺旋线遵循下述极坐标方程：r＝a×θn+b×(cosθ)m+c×(tanθ)k+d，其中，r和θ为极坐标，n，m和k分别为θ、cosθ和tanθ的指数，且-2＜n＜2，-2＜m＜2，-2＜k＜2；而且，所述内磁极和与之形状相对应的外磁极相互不接触地嵌套在一起，以在二者之间形成闭合且不对称的通道；并且，该通道在磁控管扫描靶材表面时经过靶材的中心和边缘。本发明提供一种磁控管，不仅可以实现采用较低的溅射气压就能够满足启辉和维持等离子体的工艺条件，而且还可以提高薄膜厚度在基片径向方向上的均匀性，从而可以提高成膜质量。
Abstract(English):

The invention provides a magnetron and a magnetron sputtering device. The magnetron includes an external magnetic pole and an internal magnetic pole, the polarities of which are opposite. On a radial cross section vertical to the magnetron, the internal magnetic pole is an asymmetrical closed loop which is formed through tail-end serial connection of two sections of spiral lines and the spiral lines comply with the following polar coordinate equation: r=a*Theta + b*(cosTheta)+c*(tanTheta)+d, wherein r and Theta are polar coordinates, and n, m and K are exponents of Theta, cosTheta and tanTheta and -2

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