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发明授权
CN104321702B 传感器、光刻设备以及器件制造方法 有权

传感器、光刻设备以及器件制造方法
摘要：
一种用于浸没类型的光刻设备中的传感器(100)，其在使用时接触浸没液体(11)，布置成使得从传感器的变换器(104)至温度调节装置(107)的第一热流路径的热阻小于从变换器至浸没液体的第二热流路径的热阻。因此，热流更倾向于流向温度调节装置而不是浸没液体，使得能够减小或最小化浸没液体中的温度引发的扰动。
摘要（英）：

A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.

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