This sputtering device is provided with three targets that have magnets. Magnets (7a, 7b, 7c) each are controlled so as to make: a first movement for being stopped after being moved in a reverse direction from a stroke end in a forward direction; a second movement for being stopped after being moved in the reverse direction from the stopped position after the first movement to the stroke end in the reverse direction; and a third movement for being stopped after being moved from the stroke end in the reverse direction to the stroke end in the forward direction. Furthermore, during film formation a first film formed on a substrate during the first movement, a second film formed on the substrate during the second movement, and a third film formed on the substrate during the third movement are each formed by a different target (4a, 4b, 4c). Furthermore, the first, second, and third films are controlled so as to overlap on the substrate.