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发明公开
CN104597529A 一种用于2.5～25μm波长范围内的减反射材料的制备方法 有权

一种用于2.5～25μm波长范围内的减反射材料的制备方法
摘要：
本发明属于减反射材料制备技术领域，公开了一种用于2.5～25μm波长范围内的减反射材料的制备方法。该方法是利用加速器产生的重粒子在真空室中双面辐照厚度为20～50μm的聚酯膜，并将辐照过后的样品在清洁的大气环境中放置1～3个月，使聚酯膜中的潜径迹发生光致氧化过程，然后利用氢氧化钠蚀刻液进行蚀刻得到所需减反射材料。该方法具有工艺较简单、核孔孔径深度增大、辐照粒子密度要求降低且能够实现在2.5～25μm波长范围内反射率小于1％的优点。
摘要（英）：

The invention belongs to the technical field of antireflection material preparation, and discloses a preparation method for an antireflection material within the wavelength range of 2.5-25 micrometers. Double sides of a polyester film with the thickness of 20-50 micrometers are irradiated by heavy particles generated by an accelerator in a vacuum chamber, an irradiated sample is placed for 1-3 months in a clean atmospheric environment, a latent track in the polyester film is subjected to the photo-oxidation process, and then the polyester film is etched by a sodium hydroxide etching solution to obtain the needed antireflection material. The method has the advantages that the process is simple, nuclear pore diameter depth is increased, the density requirement of irradiation particles is reduced, and reflectivity can be lower than 1% within the wavelength range of 2.5-25 micrometers.

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