The invention discloses a wafer detection method and a wafer detection device, wherein the wafer detection method comprises the following steps: starting to rotate a turnplate after receiving a command signal of rotating to a preset target position, wherein the command signal is sent from a controller; sending a detection command signal to a sensor when the controller detects that wafer placement position on the turnplate is corresponding to the position of the sensor; after receiving the detection command signal by the sensor, controlling the wafer placement position of the turnplate to rotate to the preset target position when the status of the wafer placement position of the turnplate is detected to be identical to a status recorded in the sensor. By adding the detection function before putting the wafer into a technology chamber, the problems of energy source waste and technical chamber contamination caused by conducting the technology without the wafer are effectively avoided.