The invention belongs to the technical field of vacuum film plating, and discloses an apparatus for preparing a superhard super-smooth tetrahedral carbon film through magnetron sputtering. The apparatus comprises a workpiece disk whose power is supplied by a bias power supply, and a magnetron sputtering target whose power is supplied by a power supply II, and a coil whose power is supplied by a power supply III is arranged at the front of the magnetron sputtering target. The invention also discloses a method for preparing the superhard super-smooth tetrahedral carbon film through magnetron sputtering. According to the technical scheme, a high-power pulse magnetic field and magnetron sputtering are combined, the magnetron sputtering flexibility is improved and the film plating technological window is widened.