The invention discloses a spray head type MOCVD original state stabilizing method, a chlorine-resistant double-layer spray head and a method for manufacturing the chlorine-resistant double-layer spray head. III-group source spray orifices and V-group source spray orifices are directly punched in the spray head with electric sparks to replace stainless steel capillary spray pipes with rough inner surfaces, the internal surface area of each blowhole is reduced greatly, and then epitaxial memory effect is reduced; the stainless steel capillary vacuum brazing technology not resistant to chlorine corrosion is not adopted during spray head manufacturing, so that the spray head is tolerant of online chlorine cleaning, and then it can be ensured that the epitaxial growth original state per charge is constant and controllable and close-coupling spray head type MOCVD can be perfectly applied to bulk production of high-aluminum-content third-generation semiconductor photoelectric devices; a coolant gallery of the spray head and the III-group source and V-group source blowholes are all machined by means of electric sparks, the hidden danger of leakage caused by the thin capillary tube wall is eradicated, and the harsh sealing requirement of the semiconductor industry can be met.