The invention discloses a treating apparatus for chlorosilane-containing tail gas produced in a polysilicon production process. The treating apparatus comprises: a tail gas storage tank, which is used for collecting and storing chlorosilane-containing tail gas produced in the polysilicon production process; an industrial water primary eluting tower, which is connected with the tail gas storage tank and used for industrial water primary elution of the input chlorosilane-containing tail gas produced in the polysilicon production process; and an alkali lye secondary eluting tower, which is connected with the industrial water primary eluting tower and used for alkali lye secondary elution of the tail gas having undergone elution by the industrial water primary eluting tower. According to the invention, through industrial water primary elution in the industrial water primary eluting tower, hydrogen chloride, nitrogen and hydrogen gather at the top of the industrial water primary eluting tower and pass through the secondary eluting tower, which enables hydrogen chloride to be absorbed; and then the whole apparatus is enclosed so as to obtain treated tail gas which can be directly discharged. The apparatus can effectively reduce corrosion of hydrogen chloride to the surrounding environment, overcomes the problem of manual slag salvaging and guarantees stationary and long-cycle operation of production.