The present invention addresses the problem of providing: a base generator which has high solubility in widely used organic solvents, can be dissolved directly in a base-reactive compound such as an epoxy compound, has both high heat resistance and low nucleophilicity, and enables the generation of a strong base; a base-reactive composition comprising the base generator and a base-reactive compound; a method for generating a base; and others. The present invention relates to: a compound represented by general formula (A); a base generator comprising the compound; a base-reactive composition characterized by comprising the base generator and a base-reactive compound; a method for generating a base; and others. (In the formula, R1 to R5 independently represent a hydrogen atom, an alkyl group, an aryl group which may have a substituent, or an arylalkyl group which may have a substituent; R6 represents a hydrogen atom, an alkyl group which may have a substituent, an alkenyl group, an alkynyl group, an aryl group which may have a substituent, or an arylalkyl group which may have a substituent; R7 represents a hydrogen atom, an alkyl group which may have an amino group, an aryl group which may have a substituent, or an arylalkyl group which may have a substituent; and Z- represents an anion derived from a carboxylic acid having a specific structure.)