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发明授权
CN105502929B 显示器用玻璃基板及其制造方法 有权

显示器用玻璃基板及其制造方法
摘要：
本申请的发明涉及一种显示器用玻璃基板及其制造方法，提供同时实现高应变点和防止熔解槽熔损的玻璃基板、同时实现高应变点和抑制失透的玻璃基板、或者同时实现高应变点和高蚀刻速度的玻璃基板及其制造方法。显示器用玻璃基板含有SiO2、Al2O3，以摩尔％表示B2O3为0～8％，R2O为0.01～0.8％，BaO/RO为0.05～1，应变点为670℃以上。显示器用玻璃基板或者包含含有SiO2、Al2O3、MgO，MgO/(RO+ZnO)为0.1～0.9，应变点为700℃以上的玻璃，且热收缩率为5ppm～75ppm。显示器用玻璃基板或者含有SiO2、Al2O3、BaO，B2O3为0～7％，BaO为1～15％，SiO2/Al2O3为6.0以下，应变点为700℃以上。RO表示(MgO+CaO+SrO+BaO)，R2O表示(Li2O+Na2O+K2O)。
摘要（英）：

The invention relates to a glass substrate for display device and a method for manufacturing same and provides a glass substrate which is high in strain point and capable of preventing a melting tank from melting loss, a glass substrate which is high in strain point and capable of suppressing devitrification, a glass substrate which is high in strain point and etching speed, and a method for manufacturing the glass substrate. The glass substrate contains Sio2 and Al2O3, 0-8% of B2O3, 0.01-0.8 % of R2O, and 0.05-1 of BaO/RO in mol%, and the strain point is over 670 DEG C. The glass substrate may contain Sio2, Al2O3 and MgO, 0.1-0.9 of MgO/(RO+ZnO), the strain point is over 700 DEG C, and the contraction rate is 5ppm-75ppm. The glass substrate may contain Sio2, Al2O3 and BaO, 0-7% of B2O3, 1-15% of BaO, and less than 6.0 of Sio2/Al2O3, and the strain point is over 700 DEG C. RO represents (MgO+CaO+SrO+BaO), and R2O represents (Li2O+Na2O+K2O).

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