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发明公开
CN106191774A 锡氧化物靶材及其制备方法 无效 - 驳回

锡氧化物靶材及其制备方法
摘要：
本发明提供一种锡氧化物靶材，用于制备氧化亚锡薄膜，该锡氧化物靶材包括混合均匀的单质Sn和SnO2，该锡氧化物靶材中Sn原子与O原子的原子比为1:2
摘要（英）：

The invention provides a tin oxide target. The tin oxide target is used for preparing stannous oxide films and comprises elemental Sn and SnO2 which are mixed evenly. The atomic ratio of Sn atoms to O atoms in the tin oxide target is greater than 1:2 but smaller than or equal to 2:1. The invention further provides a preparation method of the tin oxide target.

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