The invention discloses a laser etching method and device, a substrate electrode and an electroluminescent device. The laser etching method comprises a step of etching an object to be etched by laser beams, wherein the object to be etched is provided with at least one region to be etched, and the laser beams include a main laser beam for gasifying a conducting material in the region to be etched and auxiliary laser beams for lowering the temperature falling rate in a space corresponding to the edge of the region to be etched. Two types of laser beams are adopted in the etching step: the main laser beam can gasify the conducting material in the region to be etched while the auxiliary laser beams are used for raising the temperature in the space corresponding to the edge of the region to be etched, so that the temperature falling rate in the space corresponding to the edge of the region to be etched is lowered, the gasified conducting material is prevented from being deposited due to over low temperature in the space corresponding to the edge of the region to be etched during outward diffusion of the gasified conducting material from the space corresponding to the region to be etched, and the formation of bumps on the surface of the object to be etched is avoided.