The invention discloses a spraying head for MOCVD equipment. The spraying head for the MOCVD equipment comprises a plurality of gas inlet chambers which are separated from one another, corresponding gas inlet pipelines, and a tail gas guide pipe which is positioned in the centre of the spraying head. The spraying head is provided with gas inlet guide pipes and the tail gas guide pipe simultaneously; a reaction gas is sprayed into a reaction chamber front top to bottom through the gas inlet guide pipes of the spraying head, and finally, is pumped out from bottom to top through the tail gas guide pipe in the centre of the spraying head; the gas in the reaction chamber flows from the outside to the centre in a radial direction; adverse influence caused by the loss of reactants along a path can be greatly reduced; good epitaxial growth uniformity is beneficially obtained. The gas inlet chambers which are separated from one another can convey a first reaction gas, a second reaction gas or a third reaction gas selectively; by selecting suitable arrangement and combination of the gas inlet chambers, the utilization rate of a metal organic gas can be greatly improved, and reactant deposition on a side wall of the reaction chamber is basically eliminated.