The invention discloses semiconductor heat treatment equipment with a process pipe pressure control device and control methods. Two sampling points are added from one sampling point of a pressure controller in the past, wherein one sampling point can further collect pressure of an exhaust end of a process pipe, the other sampling point is used for collecting the pressure in a bearing region, the function of switching the first sampling point and the second sampling point at different stages of a process is added, and different control methods of different process steps on the pressure in the process pipe are achieved, so that the control target of preventing a gas in the bearing region from entering the process pipe at a boat lifting stage of the process can be achieved on the premise of meeting original process pressure control requirements; and the influence of air impact on the film thickness uniformity on the surface of a technical product is reduced.