The invention discloses a spectrum-selected reflection type thermal-insulation film which comprises a polyester film base layer, a lower zinc sulfide layer, a lower aluminum-titanium alloy layer, a metal layer, an upper aluminum-titanium alloy layer, an upper zinc sulfide layer and an anti-reflection and transmission-enhanced layer which are sequentially overlapped from bottom to top, wherein the polyester film base layer is a colorless transparent film with the thickness as 1 to 30 mum, the thicknesses of the upper zinc sulfide layer and the lower zinc sulfide layer are 10 to 100nm, the thicknesses of the upper aluminum-titanium alloy layer and the lower aluminum-titanium alloy layer are 1 to 50nm, the metal layer is an aluminum layer or a silver layer with the thickness as 1 to 30nm, the thickness of the anti-reflection and transmission-enhanced layer is 100 to 300nm, and the anti-reflection and transmission-enhanced layer is a monodisperse mesoporous hollow silicon dioxide sphere film. The zinc sulfide layers with a high refraction index are utilized as dielectric layers to form a D/M/D structure, so that the spectrum selectivity of the thermal-insulation film is improved; the aluminum-titanium alloy layers are arranged on the two sides of the metal layer to slow down oxidation, condensation and diffusion phenomena of the metal layer; the monodisperse mesoporous hollow silicon dioxide sphere film is utilized as the anti-reflection and transmission-enhanced layer to wholly improve the visible light transmittance of the thermal-insulation film.