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发明授权
CN106873312B 传感器、光刻设备以及器件制造方法 有权

传感器、光刻设备以及器件制造方法
摘要：
本发明提供了一种用于浸没光刻设备中的传感器、光刻设备和使用浸没光刻设备的器件制造方法。所述传感器包括构件，在传感器的使用过程中所述构件接触供给至与投影系统的最终元件相邻的空间的浸没液体；变换器，配置成将刺激转换为电信号；温度调节装置，配置成使用由冷却剂供给装置所供给的热传递介质进行所述变换器的温度调节；和控制器，配置成控制所述温度调节装置以主动地控制所述变换器的温度。
摘要（英）：

A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.

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