The invention discloses a method for preparing a single-layer diamond abrasive tool through chemical vapor deposition. According to a silicon carbide base body, a diamond abrasive material is mixed into a photoresist solution and is subject to ultrasonic vibration, rotating whirl coating is used for evenly dispersing diamond abrasive particles, uniform distribution of the particles on a base body substrate can be achieved, the CVD method is adopted to enable the diamond coating bonding agent to be subject to deposition between the diamond abrasive particles and the silicon carbide base body, the abrasive material and the base body are firmly connected together, and meanwhile, the abrasive particles grow to become high-grade cubic octahedral single-crystal particles. The prepared single-layer diamond abrasive tool is high in abrasive particle holding force, the exposure height is large, the chipping containing space is large, defects of electroplating and brazing single-layer diamond abrasive tools are overcome, and the method is suitable for preparing fine granularity (five micrometers to 100 micrometers) single-layer diamond abrasive tools. The prepared single-layer diamond abrasive tool has the wide application prospect in high-precise grinding fields of crisp and hard materials of semiconductors, optical crystals, artificial sapphire, glass and the like