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发明公开
CN107895686A 基板处理方法、基板处理装置以及记录介质 审中-实审

基板处理方法、基板处理装置以及记录介质
摘要：
本发明提供一种能够抑制处理流体的消耗量且在短时间内进行使用超临界状态的处理流体来将液体从基板除去的干燥处理的基板处理方法、基板处理装置以及记录介质。基板处理方法包括以下工序：第一处理工序，将处理容器内的流体排出，直到成为不引起处理容器内存在的超临界状态的处理流体的气化的第一排出到达压力为止，之后，向处理容器内供给处理流体，直到成为不引起处理容器内的处理流体的气化的第一供给到达压力为止；第二处理工序，将处理容器内的流体排出，直到成为不引起超临界状态的处理流体的气化的第二排出到达压力为止，之后，向处理容器内供给处理流体，直到成为不引起处理容器内的处理流体的气化的第二供给到达压力为止。
摘要（英）：

The present invention provides a substrate processing method, a substrate processing apparatus, and a storage medium capable of suppressing consumption of a processing fluid and performing a drying process of removing a liquid from a substrate in a short time using a supercritical-state processing fluid. Disclosed is a substrate liquid processing method including: a first processing step of discharging a fluid in the processing container until an inside of the processing container reaches a first discharge ultimate pressure at which the processing fluid in the supercritical state is not vaporized, and then supplying the processing fluid into the processing container until the inside of the processing container reaches a first supply ultimate pressure at which vaporization of the processingfluid does not occur; and a second processing step of discharging a fluid in the processing container until the inside of the processing container reaches a second discharge ultimate pressure at which the processing fluid in the supercritical state is not vaporized, and then supplying the processing fluid into the processing container until the inside of the processing container reaches a secondsupply ultimate pressure at which vaporization of the processing fluid does not occur.

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