The invention discloses a sputter ion pump capable of selective air pumping, and the sputter ion pump comprises an ion source, a magnetic control deflection controller, a collecting trap, and a powersupply. The ion source, the magnetic control deflection controller and the collecting trap are connected in series to form an access. The power supply supplies power to a system, provides an ion source high voltage and accelerating field, and is connected with the collecting trap so as to enable the collecting trap to be grounded. The sputter ion pump is advantageous in that the sputter ion pump can achieve the online real-time selective removing of specified gas, thereby reducing the content of gas in a vacuum environment; the sputter ion pump is wide in working pressure intensity; the sputter ion pump is simple in operation, and can control the class of removed gas through employing the power supply for adjusting the intensity of the ion source accelerating field; the sputter ion pump causes no pollution, carries out the sputtering and air pumping through a titanium (niobium) collecting trap, has no oil, and is highly clean; the sputter ion pump causes no noise and vibration; compared with a conventional method, the sputter ion pump is affected by other gas in a less manner. The sputter ion pump carries out the screening and pumping of electrified gas ions with different charge-to-mass ratios mainly through an electromagnetic field, and can be used in an occasion where the components of gas need to be controlled and specified gas (foreign matters) needs to be removed, such asa switching tube.