利索-全球专利检索

  1. 登录
  2. 注册
发明公开
CN108700819A 光刻设备和用于执行测量的方法 有权

光刻设备和用于执行测量的方法
摘要：
光刻设备是一种将所期望的图案施加到衬底上(通常在衬底的目标部分上)的机器。例如，光刻设备可以用于集成电路(IC)的制造中。光刻设备具有检查设备，该检查设备具有利用波长为2‑40nm的照射辐射的照射系统。该照射系统包括光学元件，该光学元件将照射辐射分成第一和第二照射辐射，并将时间延迟引入至第一或第二照射辐射。检测器检测已经由目标结构散射的辐射。检查设备具有处理单元，所述处理单元可操作以控制所述第一散射辐射和所述第二散射辐射之间的时间延迟，以便优化所述组合后的第一散射辐射和第二散射辐射的属性。
摘要（英）：

A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus has an inspection apparatus with an illumination system that utilizes illuminating radiation with a wavelength of 2-40 nm. The illumination system includes an optical element that splits the illuminating radiation into a first and a second illuminating radiation and induces a time delay to the first or the second illuminating radiation.A detector detects the radiation that has been scattered by a target structure. The inspection apparatus has a processing unit operable to control a time delay between the first scattered radiation and the second scattered radiation so as to optimize a property of the combined first and second scattered radiation.

公开/授权文献
0/0